Pay in 4 interest-free payments of $48.25 Learn more
Ships within 48 hours · Estimated delivery Jul 26 - Jul 31
The purpose of this Document is to define the basic interface dimensions of a load port on the semiconductor manufacturing equipment
The Standard aims to develop a durability test method to evaluate OPV/DSSC/PSC
This Guide contains definitions of terms and procedures for determining the leak rates of MFCs as used in the semiconductor industry
The decomposition of silicon oxide on silicon wafer
12-89 (technical revision)
S02500 - SEMI S25 - Safety Guideline for Hydrogen Peroxide Storage & Handling Systems Lang-Chinese (Simplified) The purpose of this DocumentThe purpose of this Safety Guideline is to set out the minimum safety and health criteria to be applied to equipment and systems for storage and handling of hydrogen peroxide in the semiconductor and flat panel display industries. This Safety Guideline addresses concentrations of hydrogen peroxide (H2O2) commonly used in the semiconductor and FPD industries (i. e., concentrations below 40% w w). This Safety Guideline is focused on the storage,
US$ 95.41
US$ 57.13
US$ 99.99
US$ 66.55
US$ 13710.34
US$ 12.99
US$ 40.99
US$ 13.99